Etec, an Applied Materials Company, designs, manufactures and markets maskmaking equipment solutions that enable the production of the faster, smaller and cheaper semiconductor chips necessary for today’s electronics. Holding a commanding worldwide market share for semiconductor IC mask pattern generation (PG) equipment-equipment that makes semiconductor masks-Etec is widely recognized for its expertise with laser- and electron-beam PG technologies. Today Etec also offers mask inspection systems. Precision lasers or electron beams in Etec pattern generation systems image the design of just one layer of a semiconductor chip onto a piece of chrome-coated quartz glass-the mask or photomask. After the design has been written on a mask, the mask is then used much like a photographic negative to transfer the circuit patterns onto semiconductor wafers. As many as 28 masks are used to build subsequent layers on the wafer. The patterns on the masks translate into the tiny transistors and electrical circuits that make up each final chip. Etec’s advanced inspection products allow maskmakers to verify accuracy and ensure higher productivity for their customers.
Mask Research and Development Etec’s advanced research and development activities extend to microcolumns, mask etch, CD SEM and other technologies where activities in our development labs offer interesting potential for future product lines.
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